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Colloidal Silica Abrasives - List of Manufacturers, Suppliers, Companies and Products

Colloidal Silica Abrasives Product List

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UP Colloidal Silica Polishing Agent for Sample Grinding [Made in Japan]

UP Colloidal Silica Polishing Agent for Sample Grinding [Made in Japan]

Particle size 0.045μm! A polishing agent that is difficult to agglomerate and settle, and can be dispersed in various organic solvents such as alcohol!

We would like to introduce the "UP Colloidal Silica Abrasive" handled by IMT Corporation. This product uses silica classified as "not applicable" under the Industrial Safety and Health Act's managed chemical substances. The product is an abrasive that can be dispersed in various organic solvents such as alcohol. With a particle size of 0.045μm, it is resistant to aggregation and sedimentation, resulting in a transparent liquid. For more details, please feel free to contact us. 【Product Lineup (Volume)】 ■1L ■5L *For more information, please refer to the PDF document or feel free to contact us.

  • Wafer processing/polishing equipment
  • Other abrasives

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IMT Colloidal Silica Polishing Agent for Sample Grinding [Made in Japan]

IMT Colloidal Silica Polishing Agent for Sample Grinding [Made in Japan]

A final polishing compound that enables the achievement of the highest level of polished surface when used in conjunction with the polishing cloth "Silica Final"!

We would like to introduce the "IMT Colloidal Silica Polishing Agent" handled by IMT Corporation. This product uses silica classified as "non-regulated" under the Labor Safety and Health Act. The product is a final polish solution for sample polishing with a pH of 9 to 10 and a particle size of 0.08 μm. By using it in conjunction with the polishing cloth "Silica Final," it achieves the highest level of polished surface. 【Product Lineup (Volume)】 ■1L ■5L *For more details, please refer to the PDF document or feel free to contact us.

  • Wafer processing/polishing equipment
  • Other abrasives

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Colloidal silica polishing material for silicon wafers 'GLANZOX'

Colloidal silica polishing material for silicon wafers 'GLANZOX'

Meeting the demands for higher flatness, damage-free, and free from heavy metal contamination with a complete mirror finish!

"GLANZOX" has made it possible to achieve excellent polished surfaces by dispersing colloidal silica in a specially formulated liquid. In recent years, there have been strict reduction requirements for metallic impurities that affect device characteristics. In response, we have developed ultra-high purity colloidal silica. We offer dedicated polishing materials such as the "GLANZOX E Series" for finishing wafer edges to a mirror-like surface. 【Features】 ■ Disperses colloidal silica in a specially formulated liquid ■ Enables the realization of excellent polished surfaces ■ Developed ultra-high purity colloidal silica ■ Provides high-dimensional polishing materials *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductors
  • others

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